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| 編號 | 包裝 | 參數 | 價格 |
| NF060 | 100ml | 單層；面積: 5cmx2.5cm | 詢價 |
| NF070 | 100 mL | 多層；面積: 5cmx2.5cm | 詢價 |
提供高質量的銅基單層六角氮化硼薄膜與銅基多層六角氮化硼薄膜，六角氮化硼結構是類石墨烯結構，具有很高的研究價值，也可以用轉移石墨烯的方法轉移六角氮化硼材料。表征完備，質量可靠。
Single layer h-BN (Boron Nitride) film grown in copper foil.
h-BN is an insulator with a direct band gap of 5.97 eV. Due to its strong covalent sp2?bonds in the plane, the in-plane mechanical strength and thermal conductivity of h-BN has been reported to be close to that of graphene. h-BN has an even higher chemical stability than graphene; it can be stable in air up to 1000 °C (in contrast, for graphene the corresponding temperature is 600 °C).
During Chemical Vapor Deposition, BN is grown on both sides of the copper foil
Specifications:
- Close to complete coverage (90-95%), with some minor holes
- Thickness of the copper foil is 20 microns
- High crystalline quality, see SAD (Selected area [electron] diffraction) data
- Quality is confirmed by TEM.
- TEM shows perfect hexagonal structure.
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On SEM image (below), BN is seen as wrinkles on top of the copper foil.
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SAD data of h-BN
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If transferred onto an SiO2?substrate, the BN film may be seen as a white film. However, it is difficult to recognize the BN film on copper using a microscope.
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Absorbance data BN on copper
